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AtomMax
Using micro-cantilever probe structures, this instrument enables 3D morphology characterization of conductive, semiconductive, and insulating solid materials, achieving wafer-level large-sample morphology characterization. Combined with an optical image, the electrically driven sample positioning stage allows for 1 μm positioning accuracy within a 200 x 200 mm area. with fully automated operations for laser alignment, probe approach, and scanning parameter adjust.ments.
Parameter | Specification |
---|---|
Sample Size | Compatible with 8-inch wafers and below |
Scanning Range | Maximum 100μm * 100μm * 910μm |
Scanning Angle | 0~360" |
Resolution | Z-axis closed-loop resolution 0.15 nm; X/Y closed-loop resolution 0.5 nm |
Scanning Probe XY Direction lmage Resolution | Not less than 32x32~4000x4000 |
Operating Modes | Contact mode, tapping mode, phase imaging mode, lift mode, multi-directional scanning mode |
Multi-Function Measurement | EFM,KFM,PFM,MFM |